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Method Of Fabricating Patterned Surfaces With Nanoparticles And Nanowires


技术优势

Simple and direct method for selective deposition of metallic nanoparticles with nanometer-scale precision.


技术应用

This method can form the basis for fabricating electronically conducting features, waveguides, and other devices for nano- electronic and photonic applications.


详细技术说明

None


附加资料

Patent Number: US7687145B2
Application Number: US2005244446A
Inventor: Frechet, Jean M. J. | Fresco, Zachary M.
Priority Date: 4 Oct 2004
Priority Number: US7687145B2
Application Date: 4 Oct 2005
Publication Date: 30 Mar 2010
IPC Current: B32B000516 | C01F000702 | C01F000708
US Class: 428403 | 428221 | 428704 | 556427 | 556429 | 556437 | 556449 | 556465 | 556482 | 556489
Assignee Applicant: The Regents of the University of California
Title: Compounds containing a thiol protected group bonded to a protecting group via a polarized bond, and structure comprising the compounds on its surface
Usefulness: Compounds containing a thiol protected group bonded to a protecting group via a polarized bond, and structure comprising the compounds on its surface
Summary: The organic compound, e.g. 3,5-dimethoxy-α,α-dimethylbenzyloxycarbony1-3-mercaptopropyltriethoxysilane, is used for forming protected thiol-containing reactive organic layer for nanoscale structure (claimed). It is used in the formation of patterns of electrically conductive nanoparticles, e.g. gold nanoparticles or silver nanoparticles, useful in nanoelectronics and photonics e.g. as electrically conducting wires, as plasmon wave guides for photonic devices or as seeds for the growth of silicon nanorods.
Novelty: Organosulfur compound as protected thiol-containing reactive layer precursor used in forming nanoscale structure, comprises protected thiol functional group, and protecting group bonded to protected functional group


主要类别

化工/材料


细分类别

化工/材料应用


申请号码

7687145


其他

Tech ID/UC Case

17447/2005-010-0


Related Cases

2005-010-0


国家/地区

美国

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