Search
  • 网站搜寻
亚洲知识产权资讯网为知识产权业界提供一个一站式网上交易平台,协助业界发掘知识产权贸易商机,并与环球知识产权业界建立联系。无论你是知识产权拥有者正在出售您的知识产权,或是制造商需要购买技术以提高操作效能,又或是知识产权配套服务供应商,你将会从本网站发掘到有用的知识产权贸易资讯。
返回搜索结果

A Method For Forming Double-gate Metal Oxide Semiconductor Field Effect Transistors


技术优势

double gate structure reduces short channel effectsdouble gates provide enhanced drive current


详细技术说明

None


附加资料

Patent Number: US6041380A
Application Number: US199810084A
Inventor: LaBerge, Paul A.
Priority Date: 21 Jan 1998
Priority Number: US6041380A
Application Date: 21 Jan 1998
Publication Date: 21 Mar 2000
IPC Current: G06F001340
US Class: 710306 | 710129 | 710105 | 713501
Assignee Applicant: Micron Electronics Inc.,Nampa
Title: Method for increasing the number of devices capable of being operably connected to a host bus
Usefulness: Method for increasing the number of devices capable of being operably connected to a host bus
Summary: Host bus operating method in multi process computer system.
Novelty: Host bus operating method applied in computer system, involves transmitting signal to primary bus after one and half cycles of which address strobe is transmitted to secondary bus


主要类别

电子


细分类别

半导体


申请号码

6413802


其他

Tech ID/UC Case

16952/2000-078-0


Related Cases

2000-078-0


国家/地区

美国

欲了解更多信息,请点击 这里
Business of IP Asia Forum
桌面版