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Generation of crystalline thin films with variable thickness regions using laser irradiation
总结
James S. Im, Ph.D.
技术优势
Decreases cost and production time of crystalline thin films with region-dependent performance requirements Allows for highly customizable production of crystalline thin filmsCan be used with several irradiation techniques, including sequential laser solidification (SLS), excimer laser annealing (ELA), and uniform grain structure (UGS).Patent information:Patent Issued (US7,691,687)Tech Ventures Reference: IR M03-054
技术应用
Fabrication of thin film transistors for LCD technologiesFabrication of crystalline thin films for image sensors
详细技术说明
James S. Im, Ph.D.
国家/地区
美国
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