"Maskless" Nano-Patterning
The invention has the following advantages over existing methods by which to form nanoholes and nanopillars: Single Stage: The process is masklessHigh throughput: Very large area (square meters, in principle) of nano-holes in a single shotHighly Uniform: Hole size is highly uniformVery Small: Hole diameter is much smaller than the wavelength of the UV light source Flexible Dimensions: Hole spacing is independent of hole size Highly Compatible: Can be used for any material compatible with standard lithography
Northwestern researchers have invented a low-cost, "maskless" photolithography method to produce highly uniform arrays of nanopillars and nanoholes over a large area. #energy #alternative #nanotechnology #lithography #fabrication
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