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Elastomer-Assisted Manufacturing
技术优势
The procedure:ΓÇóIs compatible with a wider range of substratesΓÇóEffectively allows for reduction of elastomerΓÇÖs feature dimensionsΓÇóAllows for achieving resolution limits without associated drawbacks as observed with prior art techniquesΓÇóIs capable of successfully extending the optical lithography into the nanometer scaleΓÇóGreatly improves the current nanofabrication capabilities while maintaining low cost, high reliability and throughputΓÇóWould be commercially useful for development of following systems/devices:oFlexible electronicsoConformal photo-voltaicsoMedical implantsoLarge OLED/LCD displaysoLarge sensor arraysoElectronic papersoIntegrated micro- and micro-electronic systems
详细技术说明
None
国家/地区
美国
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