Improved Dimensional Measurement through Combined Optical Scattering and Photogrammetry
- 詳細技術說明
- Patent No.: 9,151,607This invention relates to a system and method for determining the location and orientation of an object using both optical scattering and photogrammetry.
- *Abstract
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A system for determining the position and location of a module comprising: a module which includes an optical generator which generates an optical beam; a diffractive element placed in the path of the optical beam which generates an optical pattern; a reference length artifact placed in a location with close proximity to the optical pattern; and a plurality of digital cameras connected to a computer with photogrammetry software and a minimization algorithm installed on the computer; where the digital cameras are set up in different locations to take one or more digital images of the optical pattern, with at least one digital image including the reference length artifact; and where the digital images are downloaded onto the computer and processed by the photogrammetry software to generate optical coordinate data followed by the insertion of the optical coordinate data into the minimization algorithm to generate the position and location of the module.
- 國家/地區
- 美國
