Improved Wafer for Raman Spectroscopy
- 詳細技術說明
- None
- *Abstract
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Researchers from the University of Illinois have developed a nanostructure and a method of creating that nanostructure for use in Raman Spectroscopy. The wafer is fabricated using thermal dewetting, allowing for a scalable and repeatable surface for use in surface plasmon resonance techniques. It results in a greater than 10^9 wafer enhancement factor, compared to a 10^6 enhancement factor compared to other wafers made from similar techniques.
- *IP Issue Date
- None
- *IP Type
- Other Patent
- 國家
- Not Available
- 申請號碼
- None
- 國家/地區
- 美國
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