Elastomer-Assisted Manufacturing
- 技術優勢
- The procedure:ΓÇóIs compatible with a wider range of substratesΓÇóEffectively allows for reduction of elastomerΓÇÖs feature dimensionsΓÇóAllows for achieving resolution limits without associated drawbacks as observed with prior art techniquesΓÇóIs capable of successfully extending the optical lithography into the nanometer scaleΓÇóGreatly improves the current nanofabrication capabilities while maintaining low cost, high reliability and throughputΓÇóWould be commercially useful for development of following systems/devices:oFlexible electronicsoConformal photo-voltaicsoMedical implantsoLarge OLED/LCD displaysoLarge sensor arraysoElectronic papersoIntegrated micro- and micro-electronic systems
- 詳細技術說明
- None
- *Abstract
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In prior art, none of the existing technologies/mechanisms are capable of extending optical lithographic limits for elastomeric materials. Moreover, the existing lithographic techniques, such as e-beam lithography, dip-pen lithography, and nano-imprinting are associated with one or more limitations such as high cost, slow processing time, and small functional area. This invention relates to a novel procedure for elastomer-assisted manufacturing, especially for fabricating flexible electronic systems/devices.
- *Principal Investigation
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Name: Jake Rabinowitz
Department:
Name: Sivasubramanian Somu
Department:
- 國家/地區
- 美國
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