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Chemical Vapor Depositions for Mullite Coatings and Powders

详细技术说明
None
*Abstract
This invention is directed to the creation of crystalline mullite coatings having uniformmicrostructure by chemical vapor deposition (CVD). The process comprises the steps of establishing a flow of reactants which will yield mullite in a CVD reactor, and depositing a crystalline coating from the reactant flow. The process will yield crystalline coatings which are dense and of uniform thickness.
国家/地区
美国

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