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Laser Assisted Field Induced Oxide Nanopatterning
Technology Benefits
Local oxidation on H:Si(111) surfaces can be fully suppressed or activated by toggling a laser luminating a lightly doped silicon AFM cantilever. Laser assisted FIO provides an alternative and flexible means for controlling oxide nanopatterning.
Detailed Technology Description
A system to effect field induced oxidation (FIO) nanopatterning of hydrogen passivated silicon surfaces with an atomic force microscope (AFM) controlled by laser irradiation.#nanotechnology #fabrication #lithography
Country/Region
USA
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