Several molecular glasses are disclosed for use as photoresists in semiconductor lithography, especially in the Extreme Ultraviolet (EUV) regime with a radiation range of 10 - 100 nm, enabling features smaller than 0.18 µm.
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Lead Inventors: Gordana Vunjak-Novakovic, Ph.D.; Yue ZhangProblem or Unmet Need:Tissue engineering a clinically useful patch of cardiac tissue to treat the massive loss of cardiomyocytes that typically occurs during myocardial infarctions requires a large number of cells in order to ensure functiona.....
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