On the trail of plasma - Radar-based plasma characterization
The new principle of the Ruhr-Universität Bochum uses a radar-based approach for the contactless monitoring and characterization of the plasma state in real time.
Contactless measurement and suitable for high temperatures, many types of gas as well as allowing fast and dynamic measuring with simple evaluation method.
Plasmas are an indispensable tool for the production of high-quality thin films, enabling the deposition of novel surfaces and multifunctional film systems, especially on silicon, glass and plastics. Radar-based plasma characterization allows these layers to be applied with optimized homogeneity and quality.
Plasmas are used in a wide range of technical applications, including semiconductor technology. Plasma etching and plasma-induced material deposition are used to remove functional layers in a structured manner or to selectively generate surface hardening, cleaning and activation on the target surface. In order to accurately control these processes and achieve reproducible production results, a multitude of plasma properties must be known. The new principle of the Ruhr-Universität Bochum uses a radar-based approach for the contactless monitoring and characterization of the plasma state in real time. The coupled power used for excitation is monitored, and with it the change in plasma density in a plasma reactor. The plasma density in turn is directly related to the so-called plasma electron frequency, which can be used to describe the dielectric properties. In addition to monitoring the density, it also provides information on whether plasma impurities are present and whether the transient addition of the plasma has been achieved. Furthermore, it enables conclusions about the homogeneity of the plasma.
Licensing
09.12.2019
08.12.2020
DE 10 2019 133 608.2
PCT/EP 2020/085143
No CN patents
5801
德國
