Chelators to remove aluminum from the feeding solutions given to premature neonates - 1805
- *Abstract
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Overview
Aluminum is a common contaminant in many medical solutions. This is in part the result of the widespread distribution of aluminum in the environment. In addition, some medical solutions contain compounds that react strongly with aluminum and extract this metal from the walls of glass containers. This strong binding increases the aluminumcontamination and makes it much more difficult to remove the aluminum from these solutions.
Healthy adults are generally protected against oral aluminum toxicity, but there is a special concern regarding aluminum exposure to premature neonates because they routinely require several or more days of parenteral nutrition (PN) until they can tolerate oral feeding. The PN bypasses the normal protection associated with low intestinal absorption of aluminum. In addition, these infants often have underdeveloped kidney function (the primary route of aluminum elimination), which impedes the excretion of the aluminum contained in the PN solution. Furthermore, it well known that some of the small volume parenteral solutions used to prepare the final PN solutions are heavily contaminated with aluminum. The FDA has formally recognized the problem of potential aluminum toxicity to premature infants and established a safe level of aluminum exposure.
Invention
UK researchers are developing a a flow-through filter assembly to capturetrivalent and tetravalent metal ions in a solution. The body of this single-use filter is filled with a specialized chelator, such as trihydroxamate chelating resin. The other components of the filter are designed to produce a controlled fluid flow rate, using a partially evacuated vial and a flow controller that achieves a desired flow rate. This filter can be used to remove aluminum from medical solutions provided to premature neonates.
Applications
- pharmaceuticals
- feeding solutions for premature neonates
Advantages
- the filter captures hard-to-remove trivalent and tetravalent metal ions in solutions,
IP Status: U.S. Patent No. 9,259,670
- 國家/地區
- 美國
