Method for Topographical Patterning of Materials
- 詳細技術說明
- A novel methodology was developed for the patterning of chemically sensitive biological materials on various substrates.
- *Abstract
-
Cornell researchers have developed a novel methodology for the patterning of chemically sensitive biological materials on various substrates. The invention is a dry lift-off technique that allows patterning of chemically sensitive biological materials on a variety of surfaces and represents an efficient and economically practical technique to produce micrometer sized patterns of cells over areas spanning many square centimeters. The technology is useful for developing types of rapid detection, fully integrated, high sensitivity, biological sensors and actuators, as well as systems for screening of pharmaceuticals, detection of toxins, microanalysis of proteins, and DNA sequencing.
Potential Applications
- Biosensors
- Protein microanalysis
- DNA sequencing
Advantages
- Fabrication compatible with standard CMOS processing
- Excellent dimensional control
- *Licensing
- Martin Teschlmt439@cornell.edu(607) 254-4454
- 其他
-
- Ilic et al. "Topographical Patterning of Chemically Sensitive Biological Materials Using a Polymer-Based Dry Lift Off" Biomedical Microdevices 2000
- Patent: 6,559,474
- 國家/地區
- 美國
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