Permeable Polysilicon Thin Film Filter
- 技術優勢
- May be manufactured using standard thin film deposition technologyFilter membranes are simpler and more economical to produceMembranes have pore diameter in 10nm - 50 nm range
- 技術應用
- Micromachined systems and other precision devicesSeparation of biological fluidsFiltration of liquids or gases containing entrained particlesSemipermeable membrane coverings for microsensors or other devices
- 詳細技術說明
- None
- *Abstract
-
Researchers at the University of California, Berkeley have developed a method of fabricating a thin film filter membrane composed of polycrystalline silicon wtih a surface roughness approximately equal to the membrane thickness. Under the fabrication process developed at Berkeley, pores form with lateral dimensions smaller than those of the silicon grains, typically in the 10 nanometer to 50 nanometer range.
- *IP Issue Date
- Aug 24, 2004
- *Principal Investigation
-
Name: George Michael Dougherty
Department:
- 附加資料
- Patent Number: US6780786B2
Application Number: US2001994280A
Inventor: Dougherty, George M.
Priority Date: 26 Nov 2001
Priority Number: US6780786B2
Application Date: 26 Nov 2001
Publication Date: 24 Aug 2004
IPC Current: B01D007102 | B81B000300 | H01L0021285 | H01L002916
US Class: 438758 | 21032184 | 21050025 | 257E21166 | 257E29082 | 4270023 | 427167 | 427574 | 438001 | 438022 | 438745 | 1566251 | 427719
Assignee Applicant: The Regents of the University of California
Title: Method for producing a porous silicon film
Usefulness: Method for producing a porous silicon film
Summary: In microelectrochemical system and precision device, for separation of plasma from blood, for filtering liquids or gases that contain entrained particles and for forming semipermeable membrane covering for microsensor and other devices.
Novelty: Filter membrane structure used for e.g. separation of plasma from blood, has conformal layer formed on silicon film having grain structure, to provide selected chemical or biological function
- 主要類別
- 化工/材料
- 細分類別
- 化工/材料應用
- 申請號碼
- 6780786
- 其他
-
Tech ID/UC Case
17084/2001-106-0
Related Cases
2001-106-0
- 國家/地區
- 美國

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