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InGaAsN/GaAs quantum well devices

總結
Lead Inventors: Wen I WangSemiconductor quantum well device, such as a heterojunction diode laser, in which the quantum well layer is InGaAsN grown in the presence of antimony.The method for fabricating a semiconductor quantum well device involves forming a first layer of semiconductor material. A quantum well layer of InGaAsN is formed on the first layer of semiconductor material in the presence of Sb (antimony) with negligible incorporation of Sb in the quantum well layer. A second layer of semiconductor material is formed wherein the semiconductor materials of the first layer and second layer each has a wider band gap than the InGaAsN of the quantum well layer.A quantum well pseudomorphic high electron mobility transistor having a relatively thick undoped buffer layer, with GaAs grown on a semi-insulating substrate is provided.
詳細技術說明
Semiconductor quantum well device, such as a heterojunction diode laser, in which the quantum well layer is InGaAsN grown in the presence of antimony.The method for fabricating a semiconductor quantum well device involves forming a first layer ...
*Abstract
None
*Inquiry
Calvin Chu Columbia Technology Ventures Tel: (212) 854-8444 Email: TechTransfer@columbia.edu
*IR
MS99/05/06
*Principal Investigation
*Web Links
Patent number: WO0079599
國家/地區
美國

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