Programmable Soft Lithography: Solvent-Assisted Nanoscale Embossing
- 技術優勢
- Cost effectiveScalable to large–area applicationsExceptional density and feature sizecontrol
- 詳細技術說明
- All-moldable, bench-top soft nanofabrication platform that allows manipulation of nanoscale materials.#nanotechnology #lithography
- *Abstract
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Molding at the nanoscale has driven the production of high-density optical and magnetic storage media, organic light-emitting diodes, polymer photovoltaic cells, and field-effect transistors. While rigid molds may be used to imprint soft and semi-hard materials for these applications, they are quite expensive to fabricate and brittle at nanoscale dimensions. Additionally, current molding methods require the use of a different master for each pattern that is desired, leading to significantly higher costs and increased down-time. To address this, researchers at Northwestern University have developed an all-moldable, bench-top soft nanofabrication platform that can generate nanoscale patterns with programmable densities and fill factors from a single master. This new method, Solvent-Assisted Nanoscale Embossing (SANE), combines the strengths of serial fabrication techniques with those of parallel ones, in turn enabling unprecedented opportunities to manipulate the properties of nanoscale materials.
- *Inventors
- Mark HuntingtonMin Hyung LeeTeri Odom*Wei Zhou
- *Publications
- M.H. Lee, M.D. Huntington, W. Zhou, J.-C. Yang, T.W.Odom (2011) Programmable Soft Lithography: Solvent-assisted NanoscaleEmbossing. Nano Letters. 11, 311.
- 國家/地區
- 美國
