亞洲知識產權資訊網為知識產權業界提供一個一站式網上交易平台,協助業界發掘知識產權貿易商機,並與環球知識產權業界建立聯繫。無論你是知識產權擁有者正在出售您的知識產權,或是製造商需要購買技術以提高操作效能,又或是知識產權配套服務供應商,你將會從本網站發掘到有用的知識產權貿易資訊。

Composition for photoimaging

總結
An improved photoimagable cationically polymerizable epoxy based solder mask is provided that contains a non-brominated epoxy resin system and from about 0.1 to about 15 parts, by weight per 100 parts of resin system, of a cationic photoinitiator. The non-brominated epoxy-resin system has solids that are comprised of from about 10% to about 80% by weight, of a polyol resin having epoxy functionality; from about 0% to about 90% by weight of a polyepoxy resin; and from about 25% to about 85% by weight of a difunctional epoxy resin. The photosensitive cationically polymerizable epoxy based system is especially useful as a solder mask and does not contain bromine.
技術優勢
Photosensitive cationically polymerizable epoxy based solder mask does not contain bromine, it is particularly advantageous halogens in waste processing chemicals or in incinerated scrap circuit boards are regulated by environmental concerns.
合作類型
This patent is made available for free use by all, except when another provider attempts to enforce a patent in an EPC class against the provider or when a non-provider attempts to enforce any patent against the provider.
覆蓋範圍
Other
商品和服務
Waste management > Pollution control
ID號碼
US6576382

欲了解更多信息,請點擊 這裡
移動設備