Method for Large Mismatch Heteroepitaxy on Silicon
- 详细技术说明
- A versatile and cost-effective method of growing epitaxial silicon on top of single-crystal substrates was developed that enables growing large lattice mismatch materials on silicon substrates and growing patterned epitaxial features, to enable next generation electronic/photonic devices.
- *Abstract
-
A versatile and cost-effective method of growing epitaxial silicon on top of single-crystal substrates was developed that enables growing large lattice mismatch materials on silicon substrates and growing patterned epitaxial features, to enable next generation electronic/photonic devices.
The structured films grown using this method can be either single layer template or thick, multilayer complex nanostructured materials both ordered and disordered.
While single layer nanostructured surfaces can be achieved using other technologies, their typical top-down approaches are expensive and capital-intensive compared to the new Cornell method. This method also addresses the lattice mismatch size limitations of other methods and is the first technology to achieve a thick convoluted nanoporous film.
The extremely flexible fabrication method uses block copolymers and excimer lasers, leveraging the natural self-assembly of block copolymers to form complex nanoscale interpenetrating networks. It has the capability to enable the integration of high-performance planar devices with conventional silicon devices, highly desirable in a multitude of applications.
Potential Commercial Applications:
- Advanced electronics and nanophotonics integration, e.g. high-performance contacts of optically active materials such as gallium arsenide
- Energy conversion and storage devices, e.g. photovoltaic cells, battery and capacitor electrodes
- Chemical sensor substrates
Advantages:
- Can achieve a single layer or thick, multilayer complex
- Can form nanostructures from the substrate material or any compatible material that can be deposited on the template
- Enables growing large lattice mismatch materials
- Low cost potential
- *Licensing
- Carolyn Theodorecat42@cornell.edu607-254-4514
- 其他
-
- Patent applications: WO2011109702; 13/582,525
- Arora et al., Block Copolymer Self-Assembly Directed Single-Crystal Homo- and Heteroepitaxial Nanostructures, Science 330, 214-219 (2010)
- Tan, K.W.; Saba, S.A.; Arora, H.; Thompson, M.O.; Wiesner, U., Colloidal Self-Assembly-Directed Laser-Induced Non-Close-Packed Crystalline Silicon Nanostructures, ACS Nano 5 (10), 7960–7966 (2011)
- 国家/地区
- 美国
