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Grayscale Lithography Mask Generation Software (11102)

*Abstract

Grayscale lithography is a relatively underutilized process for fabricating complex 3D structures in photosensitive polymers (photoresists). As opposed to standard binary lithography (where photoresist is exposed to either all or none of the light), grayscale lithography allows for controlling the intensity of light in each region. This results in the ability to vary the depth at which the photoresist is developed. Curved structures such as ramps, domes, and microfluidic devices that would otherwise be impossible or too time intensive to fabricate can readily be produced.

        

The main drawback of grayscale lithography involves the time-intensive creation of mask files required to generate complex 3D structures. Researchers at the University of Louisville (UofL) Micro/Nanotechnology Center (MNTC) developed custom software that automatically converts stereolithography (STL) format files, easily created in 3D modeling programs such as SolidWorksTM, into grayscale mask files accepted by a Laser Pattern Generator. The University of Louisville is seeking a company interested in commercializing this innovative process for simplifying the task of generating grayscale lithography mask files.

                       

              

Advantages
■ Allows for quickly creating a part or device in a 3D CAD program, such as SolidWorksTM, and directly converting it to a grayscale mask
o Reduces amount of time required to create complex mask files
o Allows for fabrication of structures not previously possible
■ Complete control over the number of segmentation layers (Z-resolution) as well as XY-resolution
■ Allows for using a variety of different photoresists through linear and nonlinear layer segmentation options

                 

Market Applications

■ Expands the Microelectromechanical Systems (MEMS) design field by allowing a large pool of engineering professionals with pre-existing skill sets to readily design MEMS devices
■ Expands MEMS applications that require complex geometry, e.g., applications in microfluidics and microfluidic mixing
■ Ideal for Research and Development (R&D) departments, which require quick fabrication of a variety of designs

                             

Availability
This technology is available for license from the University of Louisville. For additional information, or to discuss sponsored or collaborative research and development opportunities, please contact Eric Castlen at the Office of Technology Transfer.

             

Telephone: (502) 852-2965
Email: eric.castlen@louisville.edu
Web: www.louisville.edu/thinker
ULRF Reference No. 11102

国家/地区

美国