亚洲知识产权资讯网为知识产权业界提供一个一站式网上交易平台，协助业界发掘知识产权贸易商机，并与环球知识产权业界建立联系。无论你是知识产权拥有者正在出售您的知识产权，或是制造商需要购买技术以提高操作效能，又或是知识产权配套服务供应商，你将会从本网站发掘到有用的知识产权贸易资讯。
3-D Monitoring of plasma etch endpoint using laser hologram
总结
This sensor system is composed simply of a laser, charge couplded device, and a beam expander. Laser holograms store all the interactions between plamsa and laser particles. The system is based on new concepts of light. The energy distributions extracted from laser holograms at multiple wafer places are traced to detect etch endpoints. No existing sensors can do this.
技术优势
This sensor can be used for real-time monitoring of etch endpoints during the etching of thin films at multiple positions across the wafer. Major users of this system are the makers of chips or display.
申请号码
覆盖范围
USA
商品和服务
Sale, License agreement
专利信息
Issued patent
国家/地区
南韩
欲了解更多信息，请点击 这里
